Abstract
The aluminum film with high reflectivity and low absorption in the visible wavelength region has been widely used in optical applications. In this investigation, aluminum films were prepared on glass substrates by electron-beam vapor deposition. The reflectivity of the Al thin film was measured by a Perkin-Elmer Lambda spectrophotometer in the wavelength region of 450-680 nm. The experimental measurements of reflectivity were validated with the numerical results using the Essential Macleod software. The surface topology and microstructure of the film were examined by means of atomic force microscope (AFM). The effects of the temperature and humidity on the reflectivity of the Al film were examined by the environmental test. Nanoindentation tests were employed to determine the hardness and Young’s modulus of the film. The measured hardness of the Al thin films were found to depend on the penetration depth.
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