Abstract
Aluminum films with high reflectivity and low absorption in the visible wavelength region have been widely used in optical applications. In this investigation, aluminum films were deposited on the glass substrate at various temperatures by electron-beam vapor deposition. The reflectivity of the Al thin film was measured by a Perkin-Elmer Lambda spectrophotometer in the wavelength region of 450-680 nm. The effects of the temperature and humidity on the reflectivity of the Al film were examined. Experimental results show that the reflectivity of Al films is increasing with the increase of substrate temperature.
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