Abstract
An investigation is performed into the microstructural, electronic and optical properties of Mo:ZnO (MZO) thin films deposited on glass substrates using radio frequency magnetron sputtering with various gas flow rates and deposition times. The XRD results show that all of the deposited films exhibit a strong (002) preferential orientation. The average transmittance of the MZO thin films is around 80 % in the visible light range. In addition, the resistivity and Hall mobility have values of 4.5 × 10−3 Ω-cm and 25 cm2/V s, respectively, given argon flow rate of 15 sccm, a deposition time of 40 min and a sputtering power of 100 W.
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