Abstract
AlxTi1-xOy (ATO) films were deposited by plasma enhanced atomic layer deposition (PEALD). In the deposition, it was possible to tailor the refractive index and the thickness of films by adjusting the number of cycles used for Al2O3 and TiO2 sublayers. Because optical thickness can be controlled, ATO films will be applicable to optical filters, high reflectivity coating layers and antireflection coating layers.
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