Abstract

Free carrier recombination lifetime (τ) in Si single crystals is a parameter, that characterizes the quality of the material. The primary procedure for τ measurement in ingots is photoconductivity decay (PCD) analyses, including contactless μ-PCD and eddy current methods. One of the main problem in this methods is a surface recombination influence on the PCD curve. It is usually assumed that in ingots the influence of surface recombination can be neglected. Well-known dependence of effective lifetime (τeff) on τ, surface recombination velocity (S) and sample thickness (d) describes the maximum value of a lifetime. Based on the numerical calculations of the one dimensional continuity equation we have shown that if the sample thickness exceed 5LD, the maximum lifetime cannot be achieved before PCD signal decline to 5% of maximum, so the question arises what is the interval of the decay curve where the experimental value of the τeff has to be determined. We used the range from 45-5% of the maximum PCD signal following the recommended SEMI MF 1575 standard (τSEMI). The dependencies of τSEMI on τ, d and S were calculated for different versions of PCD measurements and measurement equipment. The recommended thickness for lifetime measurements of non-passivated samples is in the range (1-5)LD. The hardware capabilities of contactless methods are compared.

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