Abstract

We report on the destructive sputtering of NiC multilayer coatings which have a periodicity of 2.7 nm, using H + as well as Ar + ions of 750 eV energy. The influence of ion bombardment on interface roughness, interface mixing and density has been investigated by monitoring this process in situ using a soft X-ray reflection system. Ion bombardment has been demonstrated to decrease the roughness of a sputtered surface while a considerable intermixing of the interface below the sputtered layer occurs. Changes in the film density have not been observed.

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