Abstract
The influence of heavy ion bombardment of thin sputtered films of TiC was studied. Using a post-deposition bombardment with krypton and xenon ions from a 600 kV ion accelerator on films of the order of 1000 Å thick, it was possible to obtain an improvement of up to 50% in the relative microhardness. Rutherford backscattering and nuclear reaction analysis as well as transmission electron microscopy were used to study the effect of the ion bombardment.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have