Abstract
A formula for the plasma pressure as a functional of the diamagnetic loop voltage is derived for a general case when the time for the magnetic flux to percolate through conducting wall of vacuum chamber is not small as compared to the plasma confinement time. An arbitrary shape of the conducting chamber and the plasma column are allowed in contrast to earlier theories based on axial symmetry of the system.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
