Abstract
The structure and composition of a material (composite) deposited onto vacuum-chamber walls from arc discharge plasma during the crystallization of cathode spot products in electric and magnetic fields is studied by the methods of electron microscopy and energy dispersive analysis. The regular character of the inclination of the columnar structure of films growing from a separated droplet fraction of the plasma near the cathode assembly during arc sputtering is established. It is shown that the magnetic field of the focusing coil has a more noticeable effect on the particle trajectory near the cathode under the used operating modes of the cathode assembly as compared to the interelectrode potential.
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