Abstract
We demonstrate an application of photo-induced silver diffusion into chalcogenide glass thin film for gray scale lithography. The gray scale chalcogenide glass masking layer generated in the present experiments was dry etched using reactive ion etching. The etching rate increases almost linearly with the total dose of absorbed light, thus forming the basis of gray scale lithography. Chemical composition as well as electronic structure on the surface of chalcogenide glassy film has been determined by high-resolution X-ray photoelectron spectroscopy (XPS) of the film at different stages of the patterning process. Influence of thermal annealing of chalcogenide film before Ag deposition has been investigated using scanning electron microscopy (SEM) and XPS techniques. It is observed that thermal annealing of the chalcogenide film slows the process of silver diffusion during the proposed processing procedure. A mechanism is proposed to explain the stages of gray scale lithography based on chalcogenide glass photoresists.
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