Abstract

Titanium Nitride (TiN) thin film has numerous applications in semiconductors, nanotechnology, and various aspects of daily life. This study presents an approach to adjusting the mechanical properties of TiNx ultrathin films, including Young's modulus, residual stress, and coefficients of thermal expansion (CTE), by varying the gas ratio of N2 and Ar during the Physical Vapor Deposition (PVD) process (DC magnetron sputtering). In the experiment, TiNx films with three different gas ratios RN (= N2/(N2 + Ar)) were investigated. To demonstrate the feasibility of this approach, TiNx films with different RN values (0.3, 0.5, and 0.8) were deposited on SiO2 beams to form composite test cantilevers. Measurements reveal significant changes (ranging from 33 % to 2-fold) in Young's modulus, residual stress, and CTE of the TiNx films by varying the gas ratio during the PVD process. As a result, this study provides a straightforward approach and guidelines for users to tailor TiNx films according to specific application requirements.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.