Abstract
Complex investigations are made of nuclear magnetic resonance of protons and fluorine on the SiO2 surface, thermo- and photodesorption of water and hydrogen from the surfaces of silicon and silicon dioxide, and also changes in the electrophysical parameters of the real silicon surface in the process of hydrogen photodesorption. Fluorination is found to lead to a considerable strengthening of the bonds of the water molecules with the coordination-unsaturated silicon atoms and also to protonization of the adsorbed H2O molecules. It is shown that strongly protonized coordination-bound molecules of water are the main source of hydrogen on the fluorinated surfaces. Ways of controlling the proton-donor properties of the surface are discussed. A dissociation mechanism is proposed of the H2O molecules on the semiconductor surface when exposed to low-energy light quanta. [Russian Text Ignored].
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
