Abstract
Abstract The rate of the reflectivity degradation for the nearest UV and visible regions was investigated depending on thickness of a sputtered layer of mirrors made of aluminum, copper, stainless steel (ss), tantalum and tungsten. The thickness of a sputtered layer was measured by the mass loss of mirror samples after every exposure to plasma with a multistep repetition of this procedure and with simultaneous measurements of refiectivity R. The ECR discharge in the H-D mixture or the reflex discharge in D2 was used similar to ion sources. In the ECR discharge the effective energy spectrum of ions bombarding the mirror surface was spread between 0.1 and 1.0 keV or between 0.1 and 1.5 keV with the ion current density ∼ 1 mA. In the reflex discharge the mean ion energy was between 0.65 and 0.8 keV with a half-width ∼0.12keV and approximately the same current density. The measurement results have shown: (1) The rate of a tested mirror degradation depends on the mirror material and on the energy spectrum of p...
Published Version
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