Abstract

We apply particle-in-cell simulations with Monte Carlo collisions to study the influence of the singlet metastable states on the ion energy distribution in single and dual frequency capacitively coupled oxygen discharges. For this purpose, the one-dimensional object-oriented particle-in-cell Monte Carlo collision code oopd1 is used, in which the discharge model includes the following nine species: electrons, the neutrals O(3P) and O), the negative ions O−, the positive ions O+ and O, and the metastables O(1D), O and O2(b). Earlier, we have explored the effects of adding the species O) and O2(b), and an energy-dependent secondary electron emission yield for oxygen ions and neutrals, to the discharge model. We found that including the two molecular singlet metastable states decreases the ohmic heating and the effective electron temperature in the bulk region (the electronegative core). Here we explore how these metastable states influence dual frequency discharges consisting of a fundamental frequency and the lowest even harmonics. Including or excluding the detachment reactions of the metastables O) and O2(b) can shift the peak electron temperature from the grounded to the powered electrode or vice versa, depending on the phase difference of the two applied frequencies. These metastable states can furthermore significantly influence the peak of the ion energy distribution for O-ions bombarding the powered electrode, and hence the average ion energy upon bombardment of the electrode, and lower the ion flux.

Highlights

  • Coupled plasma (CCP) oxygen discharges have various applications in plasma processing, such as ashing of photoresist, etching of polymer lms, oxidation and deposition of thin lm oxides

  • We see that detachment by the singlet metastable O2(b1Σ+g ) has more signi cant in uence on the ion energy distribution (IED) than detachment by the singlet metastable O2(a1∆g)

  • This agrees with our earlier observations that the O2(b1Σ+g ) state has more signi cant in uence on the electron kinetics in the oxygen discharge [48]

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Summary

Introduction

Coupled plasma (CCP) oxygen discharges have various applications in plasma processing, such as ashing of photoresist, etching of polymer lms, oxidation and deposition of thin lm oxides. Zhang et al [29] investigated dual frequency argon and oxygen discharges operated at 30 mTorr and 103 mTorr with PIC/MCC simulations They found that the self-bias increased approximately linearly with the phase angle θ, for 0 < θ < 90 for both discharge species, providing control of the ion energy. We use the 1d-3v particle-in-cell Monte Carlo collision code oopd to explore the ion energy distribution function (IED) for discharges including and excluding the detachment processes by the metastables O2(a1∆g) and O2(b1Σ+g )

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