Abstract
The overall equipment effectiveness or efficiency (OEE) is a metric that has been accepted in the semiconductor industry. OEE is simple and clear, and standards and guidelines have been developed. Nonetheless, the literature indicates imperfections in applying OEE with regard to the time base and rate efficiency. As OEE lacks a proper framework, the equipment effectiveness (E) has been developed based on a systematic approach to the equipment. E considers the effectiveness of the equipment with respect to availability, speed and quality losses. Unlike OEE, E is a performance measure for stand-alone equipment, isolated from the environment. In addition, E uses the available effective time as a basis in contrast to OEE, which uses the total time as a basis for measurement. Finally, due to the fact that E is measured directly by the production and effective time, it does not depend on the utilization of the equipment, unlike OEE. Furthermore, it has been shown that OEE does not indicate the influence of downtime and rework, whereas E gives these influences correctly.
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