Odd spin frustration in Cr(001) films thinner than three nanometers revealed by spin-polarized scanning tunneling microscopy

Abstract

We have studied the surface structure and morphology of epitaxial Cr films on Au(001) substrate with Cr thickness (${d}_{\mathrm{Cr}}$) below 3 nm. We have characterized the films prepared under various growth conditions by using scanning tunneling microscopy and spectroscopy (STM/STS), low-energy electron diffraction, and Auger electron spectroscopy. The good growth conditions of the Cr(001) films, which have atomically flat terraces without surface segregation of Au and with distinct surface states, are obtained by the following two methods. (I) ${d}_{\mathrm{Cr}}=3$ nm film realized by two-step growth, i.e., first 1.5 nm of Cr deposited at room temperature ($\ensuremath{\sim}290$ K) and an additional 1.5 nm Cr deposition at 570 K and (II) ${d}_{\mathrm{Cr}}=1.5$ nm film by room temperature growth and subsequently post-annealing at 470 K. The magnetic imaging of (I) ${d}_{\mathrm{Cr}}=3$ nm Cr(001) film was performed by means of spin-polarized STM/STS. The observed magnetic image indicates that the topological antiferromagnetic (AF) order appears in a series of adjacent terraces and two types of spin frustration caused by screw dislocations lead to modifications of the topological AF order. One type of spin frustration is accompanied by narrow domain walls between two screw dislocations. The other type is a complex spin frustration caused by a cluster of an odd number of screw dislocations. The difference of the two types of spin frustration is explained through a micromagnetic simulation. We have also identified a large spin-frustrated area, consisting of a cluster of multiple number of screw dislocations.