Abstract
The conditions for obtaining tin-nitrogen films by reactive cathodic sputtering in a d.c. system have been determined. The influence of the sputtering parameters on the deposition rate and the density of the films was studied. The amorphous nature of the films was demonstrated by electron diffraction. The different components were identified by microanalysis and infrared spectroscopy. The study shows that the films consist of an amorphous tin nitride matrix Sn 3N 4 containing molecular nitrogen and traces of free tin.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
