Abstract
A mode of obtaining of non-stoichiometric titanium oxide film in magnetron system with turbomolecular pump of low performance was found. The mode provides significantly lower volumetric flow rate of argon and reactive gas comparing with known mode. Dependencies of discharge voltage and film sputtering rate on reactive gas volumetric flow were investigated. Measurements of film obtained by the mode with low oxygen volumetric flow proved deviation of composition stoichiometry.
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