Abstract
A kinetics of surface transformations and ashing of high energy high dose As+ implanted resists was studied. Continuous bulk polymer structures, having minimum cross-sectional dimensions 10–30 times larger than the initial resist thickness, were found. These structures, named as giant folds, are formed as a result of heating and melting of the normal polymer resist sublayer and its interaction with a mechanically deformed implanted resist layer. The giant folds are responsible for the most difficult to remove surface remaining features of ion implanted resists processed in downstream gas discharge ashers. It is shown that the main problem of dry ashing of ion implanted resists of this type is the flow patterns of the normal resist sublayer, not the hard implanted surface layer itself.
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More From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
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