Abstract
The initial oxidation of a Si(110)-16×2 clean surface, both at room temperature (RT) and elevated temperatures (635, 660 °C), was investigated by scanning tunneling microscopy (STM). The effects of annealing (300 °C, 15 min) on an RT-oxidized surface were also investigated. On the RT-oxidized surface, a BN site, detected as a bright (B) spot in the filled-state image but as a normal (N) 16×2 adatom in the empty-state image, was observed. After annealing, DD, BD, and BB sites were found to exist in addition to the BN site. Here, DD (BD, BB) is a site that appears dark (bright, bright) in its filled-state image and appears dark (dark, bright) in its empty-state image. The relative population is DD>BD≈BN>BB. For oxidation at 635 °C, DD, BD, and BN sites were observed. For oxidation at 660 °C, only the BD site was observed. On the basis of these results, an atomistic process during the initial oxidation of the Si(110)-16×2 surface is discussed.
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