Abstract
FeSi films have been rf sputtered on glass, fused silica, and Si substrates. Sputter targets of 2 and 7 wt% Si were used, and the film thickness was varied between 0.1 and 4 μm. Several films, especially those on glass in the 0.5-μm-thickness range, showed a characteristic roughly rectangular domain structure. The films were isotropic. The structure has been analyzed with the longitudinal magneto-optic Kerr effect by rotating either the film or the demagnetizing field in the film plane. The magnetization made an angle of about 18° with the longer walls. A new magnetization process, ``wall rotation'', could be observed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
