Numerical Simulation of Heat and Mass Transfer in a Liquid Film Moving Over a Heated Horizontal Surface Under the Action of a Gas Flow

Maria V Bartashevich,Maxim G Vlasenko,Andrey A Chernov,Andrey A Pil’Nik,G.V Kuznetsov,A.O Zhdanova

doi:10.1051/matecconf/201711001011

Abstract

Heat and mass transfer during desorption on a horizontal film of lithium bromide water solution flowing on a heated wall under the action of shear stress is numerically investigated in this paper. The shear stress on the film surface is set by the motion of surrounding saturated water vapor. It is shown that at low values of heat flux the film temperature and vapor concentration in the solution downstream decreases due to desorption. However, with an increase in heat flux, general film heating and desorption slowing down are observed.

Highlights

We consider the two-dimensional stationary flow of a laminar liquid film of thickness h over a horizontal plate
In the paper, combined heat and mass transfer in the process of desorption on a liquid film moving on a heated horizontal substrate under the action of shear stress is numerically investigated
The investigation of thin liquid film flowing down a vertical wall in the roll-wave regime in presence of heat and mass transfer through the free surface was presented in [3,4]

Summary

Problem statement

In the paper, combined heat and mass transfer in the process of desorption on a liquid film moving on a heated horizontal substrate under the action of shear stress is numerically investigated. The investigation of thin liquid film flowing down a vertical wall in the roll-wave regime in presence of heat and mass transfer through the free surface was presented in [3,4]. The analytical solution to the problem of conjugate heat and mass transfer in a laminar falling liquid film with a linear velocity profile is presented in [6]. Where F LUD / (1 Ci ) , L is latent heat of phase transformation, J/kg; U is solution density, kg/m3; O is heat conductivity, W/(mK) This equilibrium condition joins equilibrium temperature Td with concentration Cd. We set on the wall at y 0 :. On the wall at K 0 , we obtain: wT wK K 0 qw , wJ wK K 0 0 , where qw is dimensionless heat flux

Numerical calculations

Conclusions