Abstract
Effects of cesium vapor injection on H− production in a tandem negative ion source are studied numerically as a function of plasma parameters. Model calculation is done by solving a set of particle balance equations in steady-state hydrogen discharge plasmas. By including H− surface production processes caused by both H atoms and positive hydrogen ions, enhancement of H− production and pressure dependence of H− production observed experimentally are well reproduced in the model. Besides these, electron temperature dependence of H− production is also discussed.
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