Numerical Investigation for $\hbox{CF}_{4}$ Decomposition Using RF Low-Pressure Plasma

Abstract

Among perfluorocompounds, is considered to be one of the most stable and difficult-to-decompose gases. We investigated the decomposition of CF4 using the inductively coupled plasma (ICP) reactor with radio frequency (RF) power supply, which was used for semiconductor cleaning process as well as decomposition. This technology was confirmed to achieve an extremely high efficiency and more economical system in comparison with the conventional system. The purpose of this paper is to perform numerical simulation of CF4 decomposition using RF low-pressure plasma. The experimental investigation of CF4 the decomposition was performed to validate the computed results, and the reaction products such as CO, CO2, and COF2 upon the CF4 decomposition were measured CO2 using a analyzer and a Fourier transform infrared spectrophotometer. Then, the numerical simulations of the CF4 decomposition using commercially available code were performed to obtain the gas temperature, electron temperature, electron number density, gas velocity, and chemical species number density distribution to cope with CF4 the decomposition in the ICP reactor.