Abstract
Among perfluorocompounds (PFCs), we focused on CF/sub 4/ used in semiconductor manufacturing process which was considered as one of the most difficult to decompose gas. We have investigated the decomposition of CF/sub 4/ using the inductively coupled plasma (ICP) reactor with RF power supply. This technology was confirmed to achieve a high efficiency and more economical system in comparison with the conventional system. The reaction products such as CO, CO/sub 2/ and COF/sub 2/ upon CF/sub 4/ decomposition were measured using a CO/sub 2/ analyzer and an FTIR. The mechanisms of CF/sub 4/ decomposition through the analysis of reaction products and numerical simulations were studied. Numerical simulation was carried out to obtain gas temperature, electron temperature, electron number density and chemical species number density distribution to cope with CF/sub 4/ decomposition in the ICP reactor.
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