Numerical Analysis of Particle Deposition onto Horizontal Freestanding Wafer Surfaces Heated or Cooled

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ABSTRACT Numerical analysis was performed to characterize the particle deposition behavior on a horizontal freestanding wafer with thermophoretic effect under the turbulent flow field. A low Reynolds number turbulent κ-e model was used to analyze the turbulent flow field around the water. The deposition mechanisms considered were convection, Brownian and turbulent diffusion, sedimentation, and thermophoresis. The averaged particle deposition velocities and their radial distributions for both the upper and lower surfaces of the wafer were calculated from the particle concentration equation in an Eulerian frame of reference. When the wafer is unheated, in the diffusion-controlled deposition regime with particle size dp < 0.1 μm the averaged particle deposition velocity under the turbulent flow was about 1.3 times higher than the laminar flow case, and the local deposition velocity near the center of the wafer was high equivalent to that near the edge. The particle deposition on the lower surface was compara...