Abstract
Computer simulations of one-dimensional multi-fluid equations are used to study the effects of C2H4 addition on the plasma chemistry and formation of nanoparticles in a capacitively coupled Ar/C2H2 plasma. The results indicate that the most important effect is an enhanced production of hydrogen-rich species, especially C4H4. Regarding the effect of C2H4 inlet on different routes of nanoparticles nucleation, it was found that the nucleation via growth of neutral molecules is significantly suppressed, while the radicals and anions remain almost unaffected. As C2H4 participates in many cationic reactions, the concentrations of hydrogen-rich cations are largely enhanced, whereas those of carbon-rich cations are reduced. The numerical results also suggest that the main mechanism behind the production of C6H6 is the insertion of the C2H3 radical into C4H4. The concentrations of the precursors species of C6H6 are increased with an increase in the pressure but are reduced with the applied RF voltage.
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