Abstract
Abstract Nuclear magnetic resonance (NMR) measurements of 1H in samples of hydrogenated amorphous silicon made by the very-high-frequency (70 MHz) glow discharge (VHFGD) technique show that the local hydrogen bonding is very similar to samples made by the ordinary r.f. glow discharge (RFGD) technique. Differences observed between RFGD and VHFGD samples in experiments such as hydrogen evolution or infrared spectroscopy are therefore due to differences in the longer-range order. In addition, spin-lattice relaxation measurements of the bonded hydrogen as a function of temperature indicate that the total concentration of trapped molecular hydrogen (H2) in the VHFGD films is most probably also similar to that observed in the RFGD samples.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call