Abstract
New configurations for polymer-based multilayered grating-waveguide structures whereby the waveguide layer is spun-coated over a Si substrate and the grating layer is obtained by holographic recording, are presented. Such structures are demonstrated in a hybrid semiconductor–organic material configuration. Experimental results reveal a spectral bandwidths down to 1 nm at FWHM with an incident intensity reflectivity reaching 72%. Narrow bandwidth, high reflectivity along with considerably simpler fabrication entailing the possibility of cost reduction as compared to costs compared to currently used pure semiconductor technologies, make these original grating-waveguide structures relevant candidates towards WDM optical communication networks.
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