Abstract
Thick-film photolithography based on SU-8 has gained great interest in the field of microreplication technologies. For replication applications the SU-8 structures themselves or electroplated copies of the resist structures are used as casting or embossing tools. In this paper, a simple estimation model is proposed to predict the sidewall profiles of SU-8. This model is based on the effects of Fresnel diffraction and absorption resulting in useful approximations for the pattern profile of SU-8. Its usefulness is successfully verified by experimental results; the estimated and experimental results show similar trends. In addition, by utilizing this model two exposure methods based on reflection and refraction could be developed which avoid negatively sloped sidewall profiles of SU-8. Using these exposure methods, SU-8 preforms without undercut for the replication of optical waveguides have been achieved.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
