Abstract

Thin films (20-150 nm thickness) of poly(o-anthranilic acid) with various doping levels were prepared on silicon substrates with deposited indium tin oxide, and their topography and current-voltage (I-V) characteristics were quantitatively investigated using current-sensing atomic force microscopy with a platinum-coated tip. The films were found to have a surface morphology like that of orange peel, with a periodic modulation and a surface roughness. The films exhibited nonuniform current flows and I-V characteristics that depended on the doping level as well as on the film thickness. Films with a high doping level were found to exhibit Zener diode switching behavior, whereas the films with a very low doping level (or that were dedoped) exhibited no current flow at all, and so are insulators. Interestingly, self-doped films (which are at an intermediate doping level) were found to have a novel electrical bistability, i.e., a switching characteristic like that of Schottky diodes, and increasingly insulating characteristics as the film thickness was increased. The films with thickness < or =62 nm, which exhibited this novel and stable electrical bistability, can potentially be used in the fabrication of high-density, stable, high-performance digital nonvolatile memory devices based only on transistors. The measured current images and I-V characteristics indicate that the electrical switching and bistability of the films are governed by local filament formation and charge traps.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call