Abstract
Advanced Patterning Film (APF, Amorphous Carbon) is newly developed hard mask material by APPLIED MATERIALS, Inc. for fine pattern definition, especially used in ArF immersion process. Amorphous carbon is one candidate of core materials of Self-Aligned Double-Pattering (SADP) process, but it is usually suggested not to use wet clean process after pattern definition due to moisture absorption of APF. We successfully demonstrate better amorphous carbon surface clean performance without any film damaged. Line edge roughness (LER) is improved from 3.03nm to 2.48nm (18.2%) and without pattern even-odd space issue beyond 2xnm generation.
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