Abstract
Nondestructive determination of damage depth profiles in ion-implanted semiconductors by spectroscopic ellipsometry using different optical models : Fried, M.; Lohner, T.; Aarnink, W.A.M.; Hanekamp, LJ.; van Silfhout, A. Journal of Applied Physics, Vol. 71, No. 6, pp. 2835–2843 (15 Mar. 1992)
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