Abstract
We constructed a sample reclining stage for soft X-ray emission spectroscopy (SXES), where we intended to carry out nondestructive depth profiling using an incident angle variation (IAV) method. The penetration depth of an incident electron decreases with a reclining sample stage. One of the characteristics of the IAV method is that the incident electron beam energy is constant; thus, it is easy to obtain information related to a quantitative analysis of the integrated intensity of soft X-ray emission spectra. This method has been applied for a specimen with NiSi2/Si(111) structure. We have analyzed the change in shape of the Si L2,3 emission band spectrum in a region of the Si substrate to the NiSi2 layer, and have shown that we can determine the distribution of the Si element from the integrated intensity of Si L2,3 emission spectra.
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