Nondestructive characterization of the film quality and stress states in diamond films on various substrates

Abstract

Diamond films deposited on various substrates were characterized nondestructively by Raman spectroscopy and X- ray diffraction (XRD) to evaluate their stress states and film quality. The X-ray diffraction method is further divided into two methods, i.e., the low incident beam angle X-ray diffraction, and Clemens-Bain method for the textured films. The whole-pattern-fitting structure refinement method, or called `Rietveld method' was adapted in XRD method to improve its accuracy. The film adhesion, film morphology and film structures including its non-diamond carbon content, crystal size, texture coefficient, film thickness and surface roughness were also examined. The correlations between structure and residual stress of the films on various substrates and under various deposition and pretreatment conditions were analyzed. The feasibility of nondestructive evaluation the film quality and stress states, and the origins of the residual stress of the films were discussed.19