Noise analysis of NC-GAAFET cylindrical nanowire with non-uniform interface trap charge

Abstract

In this article, low to high frequency noise behavior analysis of negative capacitance gate-all-around field effect transistor (NC-GAAFET) MFIS structure Silicon Nanowire (SiNW) device, using Sentauras TCAD simulations, is investigated. The NC-GAAFET SiNW yields on current (ION) 5.31 times larger and off current (IOFF) is significantly reduced by ∼ 105 orders compared to baseline SiNW. The device exhibits an excellent switching ratio of 5.2 × 1014. Average subthreshold swing for the NC-GAAFET is 33 mV/dec compared to 64 mV/dec of baseline nanowire. The Negative-DIBL for the device is −20 mV/V which outshines earlier findings. Furthermore, the drain current noise power spectral density (PSD) Sid, and input referred gate voltage noise PSD (Svg) are comprehensively analyzed in the presence of Gaussian trap (non-uniform) distribution. The analysis indicates that, flicker or (1/f) noise dominates in low frequency regime, generation-recombination (G-R) noise is more influential in mid frequency regime whereas in very high frequency regime diffusion noise is leading. The device exhibits least Sid(NET) and Svg(NET) at tfe = 6 nm compared to baseline, tfe = 5 nm, and 7 nm.