Abstract
The sputter gun system has a unique feature which is that the substrate holder is electrically isolated from and physically outside the cathode and anode gun assembly. As a result the substrate surface temperature can be maintained at a lower level than that for the conventional diode sputtering system. This feature is particularly useful for metallization by the lift-off process. NiFe films with excellent physical and magnetic properties have been obtained. The application to overlay patterns for single-level masking bubble devices is presented.
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