Nickel Texture Adjustment on Si and Ge and Its Impact on Nickel Silicide and Germanide

Abstract

Nickel silicide offers advantages over cobalt silicide, but comes along with possible elevated p source-drain leakage currents. In this paper, the effect of deposition temperature on the Ni texture on Si and Ge and its correlation to the silicide and germanide texture is studied for a better control of their properties. A shift from fiber texture to epitaxial Ni growth and an impact on the silicide and germanide texture was found.