Nickel self-diffusion in silicon-rich Si–Ni melts

Abstract

The nickel self-diffusion coefficient in Si–Ni melts was measured for compositions up to 20at.% Ni in a temperature range from 270K below to 200K above the liquidus temperature by using quasielastic neutron scattering in combination with electromagnetic levitation. Ni self-diffusion coefficients are in the order of 10−8m2∕s, fairly independent of the Ni concentration. Diffusion coefficients calculated from viscosity data of pure liquid silicon via the Stokes–Einstein relation compare well with the Ni self-diffusion obtained here, indicating a strong correlation between the mobility of the silicon and nickel atoms.