Abstract
Diffraction gratings on spherical mirrors can be used instead of aspheric mirrors in soft x‐ray projection lithography. A method for converting aspheric mirrors to gratings on spherical mirrors is introduced, and used to design optics for soft x‐ray projection lithography. Ray tracing through the new grating optics shows resolution capability better than 0.1 μm which is comparable to that of the conventional aspheric mirror optics. To reduce chromatic aberration, however, the spectral width of the system should be less than 0.05 nm for 13 nm wavelength. The gratings typically have spacing of 50–1000 μm, and can be fabricated using a binary process. This approach reduces stringent accuracy requirements of aspheric mirror optics for soft x‐ray projection lithography.
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