Abstract
Plasma source ion implantation is a non-line-of-sight ion implantation technique for surface modification of materials, but that technique is only suitable for outer surface modification of hollow targets, not for inner surface modification. In this article we present a new method that applies to inner surface implantation. Preliminary experimental results show that this new method increases plasma density and uniformity inside the tubular target with the inner surface, generates a plasma sheath between the inner surface of the target and the plasma to implant the inner surface of the target effectively, and achieves a dose uniformity that is acceptable for industrial applications.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
More From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.