Abstract
Charge-based capacitance measurements (CBCMs) are widely used to estimate on-chip wiring capacitances because of their accuracy and simplicity. Enhanced CMOS transducers for CBCM have been recently proposed that exploit cross-talk to selectively measure cross-coupling capacitances. In this paper, we propose two new applications of cross-talk-based capacitance measurements: mismatch measurement of stacked metal-metal capacitor pairs, and localization of wire interruptions. We present the measurement techniques, we discuss their implementation and we report preliminary experimental results.
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