Abstract
We newly developed a negative photo-definable polyimide dry films with higher photoreactivity than conventional ones. We succeeded in fine and high aspect ratio patterning with 90 μm thickness and 8 μm width by using new polyimide dry films. When compared after curing, the tensile breaking strength and share strength of new and conventional polyimide dry films were almost the same. However, when compared after PEB and exposure, the new ones showed clearly higher properties than conventional one. Using this polyimide dry film as an inter-layer dielectrics or a permanent resist was effective in improving the wiring density of electric devices.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.