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Abstract
A thin and uniform residual layer, especially zero-residual layer, is highly desired in the nanoimprint lithography, because it is critical to the succeeding pattern transfer process. In this study, a partial cavity filling method was applied on UV-curable resins instead of thermal plastic polymer to realize zero-residual layer based on a hybrid nanoimprint technique. The initial thickness of the UV-curable resin on the substrate was precisely quantified less than the cavity volume of the imprint mold by adjusting the resin concentration and spin coating speed. A near-zero-residual layer was successfully achieved under an extremely low imprint pressure by the control of the viscosity, surface tension and thickness of the UV-curable resist.
Published Version
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