Abstract
We demonstrate near-stoichiometric Ti:Sc:LiNbO3 strip waveguide fabrication starting from a congruent LiNbO3 substrate with a technological process in sequence of Sc3+-diffusion-doping, Ti diffusion, and post Li-rich vapor transport equilibration. We show that the waveguide is in a near-stoichiometric composition environment, well supports single-mode propagation at 1.5 μm wavelength under both TE and TM polarizations, shows considerable polarization dependence, and has a loss ≤ 0.4/0.7 dB/cm for TE/TM mode. The Ti4+ surface profile can be fitted by a sum of two error functions, the depth profile can be fitted by a Gaussian function, and the Sc3+-profile part which has a concentration above the threshold of photorefractive damage entirely covers the waveguide, showing that the waveguide is expected to be optical-damage-resistant.
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