Near‐Field Plasmons Imaging and Energy Analysis on Bi2Te3 Film

Abstract

AbstractTopological materials have great potential in lossless electronic transportation. Bi2Te3 as three‐dimensional (3D) topological insulator is predicted to exhibit many amazing electromagnetic characteristics, which are widely studied all over the world. However, current research available on Bi2Te3 materials is not adequate, and a comprehensive understanding of its properties is necessary. In this work, near‐field plasmon imaging based on Bi2Te3 nanostructures and the kinetic energy spectra of emitted electrons from Bi2Te3 film by using photoemission electron microscope instruments is studied. Under UV laser excitation of 273 nm, the electrons can be excited from the trap states in bandgap, which provides a feasible idea for observing the trap energy levels of Bi2Te3 materials. Moreover, the imaging applications of nanostructures in Bi2Te3 film based on their polarization‐dependence and wavelength‐dependence properties are also demonstrated, providing a more degrees of freedom for imaging, and can realize multidimensional and multi‐multiplexing imaging technology of topological materials. This work provides a novel method to enrich the Bi2Te3 film properties from the view of near‐field plasmon imaging and kinetic energy distribution, paving the way for realizing practical applications of topological materials.