Abstract
A near-field optical microscope has been used for probing the surface plasmon fields on a smooth silver film with superimposed specifically designed nanoscale surface structures. These structures can be tailored by means of electron-beam lithography. Interference patterns resulting from scattering of surface plasmons have been observed, together with enhanced near-field intensities localized to subwavelength areas. The spatial profile of the surface plasmon enhanced near-field can be changed by adjusting the design parameters of the surface structures.
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