Narrow-aperture electron beam in the forevacuum pressure range as a tool for dimensional processing of silica glass

Aleksey Zenin,Ilya Bakeev,Aleksandr Klimov,N.O Kopanitsa,L.A Teplyakova,V.S Plevkov,P.A Radchenko,T.Y Ovsyannikova,A.A Klopotov

doi:10.1051/matecconf/201814303006

Abstract

The paper gives overview of the results of using narrow-aperture electron beam generated by a forevacuum plasma electron source as a tool for treatment of electrically non-conductive materials, such as technical glass. Effectiveness of electron beam treatment of non-conductive materials is caused by almost complete neutralization of target charge on the treated surface. Charge neutralization occurs due to ion flow from beam plasma generated while transporting the beam through forevacuum pressure area. The study demonstrates the possibility to control depth and form of milling by changing modes of electron beam treatment. Combined use of electron beam and automated system for beam deflection and sweep makes possible to perform dimensional processing, particularly cutting and milling with complex trajectory. Milling rates were experimentally found depending on treatment time and mode. The suggested method of silica glass treatment represents an alternative for traditional treatment methods.

Highlights

Due to the unique properties, such as high electric strength, low coefficient of thermal expansion, and high chemical resistance, silica glass is widely used in numerous industries [1]
Experimental studies on electron beam treatment of silica glass showed that intense material vaporization occurs at accelerating voltage of 10 kV and a molten pool is formed in the treated area
The performed research demonstrates that a knife-like cavitation is formed while treating silica glass specimens with electron beam

Summary

Introduction

Due to the unique properties, such as high electric strength, low coefficient of thermal expansion, and high chemical resistance, silica glass is widely used in numerous industries [1]. Whereas electron beam treatment can be effectively used for performing operations with thick-wall silica glass products and products with complex shape, as well as for removing shortcomings of the existing treatment methods [5-8]. Advance of plasma electron sources able to function in forevacuum pressure areas between 10 and 100 Pа [8] considerably extend opportunities for electron beam treatment of electric non-conductive materials and for their surface modification.

Results

Conclusion