Abstract

We describe the electron beam evaporation of aluminum oxide ceramic in the pressure range of 5-15 Pa using the forevacuum plasma electron source. In the irradiation of an ceramic target by an electron beam in the fore-vacuum pressure range, the target potential is much lower than the electron beam energy, offering the possibility of direct electron evaporation of insulating ceramic materials. The speed of ceramic evaporation was 4 g/h, while the electron beam power density of 10 kW/cm2. These results open the possibility of effective application of ceramic coatings on the basis of electron-beam technologies in the forevacuum pressure range.

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