Abstract
In order to obtain narrow linewidth semiconductor laser around 1564 nm, we design a distributed Bragg reflector (DBR) laser with high-order Bragg gratings (HOBGs) using butterfly encapsulation. The DBR laser is fabricated only by i-line lithography technology with grating period of 4. 84μm, groove width of 1. 5μm and grating length of 72μm on a strip width of 4μm. The 1mm-long devices achieved an output power of 9.9 mW and a side mode suppression ratio (SMSR) more than 30 dB without facet coating at an injection current of 80 mA. The lasers showed ultra-narrow Lorentz linewidth of 70 kHz. This paper provides a simple method for large-scale production of narrow linewidth semiconductor lasers.
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